UNIST has embarked on a new partnership with Foosung Co., Ltd., a representative company of Ulsan, known as a leading figure of special gas for semiconductor industries.
On December 15, UNIST officially announced the launch of their new joint research platform to help reduce carbon emissions for a cleaner future. The joint research purpose of this is to establish an open joint research platform for the development of low-global warming potential (GWP) etching technologies. A signboard-hanging ceremony was also held to celebrate the opening of new research platform, namely ‘Foosung Co., Ltd.-UNIST Joint Research Platform.’
The ceremony was held in the order of a brief introduction of the joint research platform, congratulatory remarks, and the signboard-hanging ceremony of the ‘Foosung Co., Ltd.―UNIST Joint Research Platform.’
Through this platform, the two organizations have agreed to deepen cooperation in the following areas: △ Development of Low-GWP etching gas and related technologies, △ Development of process technologies and materials for next-generation semiconductors, △ Discovery of next-generation source technologies via industry-academic cooperation technology exchange meetings, △ Joint use of research facilities and equipment, △ Exchange of research personnel, △ Exchange of information and experience in science and technology, and △ Talent cultivation.
Meanwhile, the opening ceremony of Foosung Co., Ltd.―UNIST Joint Research Platform was attended by President Kook Hur of Foosung Co., Ltd., Deputy Mayor Hyo Dae Ahn for Economic Affairs of Ulsan, Director Il-Hwan Kim of Fine Chemical and Material Technology Support Department at Ulsan Technopark, UNIST President Yong Hoon Lee, Dean Sung Youb Kim of College of Engineering, Dean Hongsik Jeong of UNIST Graduate School of Semiconductor Materials and Devices Engineering, and Director Tae Joo Shin of UCRF.