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    • UNIST Novatus Graduate Students Turn Classroom Project into KRW 1 Billion National AI Grant 18 hours ago
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Home Graduate School of Semiconductor Materials and Devices Engineering

New Study Unveils the Art of Custom-Intercalating 42 Metals into Layered Titanates

Their findings have been published in the online version of Advanced Materials on December 26, 2025.

New Study Unveils the Art of Custom-Intercalating 42 Metals into Layered Titanates

Abstract Layered titanates (LTs) offer exceptional structural and chemical tunability, enabling precise modulation of their electronic states and catalytic properties. However, systematic studies on the range of cations that can serve as in... Read More

Jan 22, 2026 By JooHyeon Heo Research
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Revolutionary Method Enables Rapid, Eco-Friendly Production of Multi-Metal Nanostructures Using CO2

The findings of this research were published online in Nano Letters on November 21, 2025.

Revolutionary Method Enables Rapid, Eco-Friendly Production of Multi-Metal Nanostructures Using CO2

Abstract Multielement nanostructures promise unusual properties but are constrained by crystalline frameworks limiting incorporable cations, and prevailing syntheses rely on harsh conditions restricting practicality. Here we introduce a CO2... Read More

Dec 16, 2025 By JooHyeon Heo Research
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Breakthrough in 2D Semiconductor Materials Paves the Way for Next-Gene Ultra-Scaled Chips

The findings of this research have been published in ACS Nano on November 4, 2025.

Breakthrough in 2D Semiconductor Materials Paves the Way for Next-Gene Ultra-Scaled Chips

Abstract The demand for low contact resistance in two-dimensional (2D) nanoelectronics has positioned semimetals as ideal contact materials, owing to their ability to minimize the formation of metal-induced gap states (MIGS). While the cont... Read More

Dec 01, 2025 By JooHyeon Heo Research
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UNIST Researchers Uncover Causes of Overestimated Semiconductor Performance Metrics

Published in the October 2025 issue of ACS Nano, this study reveals up to a 30-fold overestimation of charge mobility.

UNIST Researchers Uncover Causes of Overestimated Semiconductor Performance Metrics

Abstract Amorphous oxide semiconductor-based thin-film transistors (oxide TFTs) were first demonstrated in 2004. These devices offer numerous advantages, including low-temperature processing, high carrier mobility, and ultralow off-current.... Read More

Nov 12, 2025 By JooHyeon Heo Research
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Researchers Develop Innovative Process to Enhance Semiconductor Device Performance

The findings of this research were published in the September 2025 edition of International Journal of Extreme Manufacturing.

Researchers Develop Innovative Process to Enhance Semiconductor Device Performance

Abstract Atomic layer deposition (ALD) is extensively used to fabricate doped dielectrics due to its ability to deposit conformal films with atomic-scale thickness control. Al-doped TiO2 (ATO) is a promising high-k dielectric for dynamic ra... Read More

Oct 26, 2025 By JooHyeon Heo Research
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Metariver Donates KRW 4 Billion Worth of Semiconductor SW to UNIST

The signing ceremony for the memorandum of understanding (MOU) was held on September 18, 2025.

Metariver Donates KRW 4 Billion Worth of Semiconductor SW to UNIST

UNIST has taken a significant leap forward in strengthening its semiconductor education and research capabilities. This advancement comes through a generous donation from Metariver Technology Co., Ltd., which has provided state-of-the-art s... Read More

Sep 19, 2025 By JooHyeon Heo News
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Researchers Unveil Innovative Deposition Technology for Uniform Metal Alloys at the Atomic Scale

Their findings were published online in Advanced Science on May 28, 2025.

Researchers Unveil Innovative Deposition Technology for Uniform Metal Alloys at the Atomic Scale

Abstract Atomic layer modulation (ALM) presents a novel approach for controlling the stoichiometry of platinum-ruthenium (PtRu) alloys rather than a tedious atomic layer deposition (ALD) supercycling multielement ALD process. This method se... Read More

Jul 11, 2025 By JooHyeon Heo Research
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UNIST Takes Part in 2025 Korea-Netherlands Advanced Semiconductor Initiative

The '2025 Future Chips Academy' took place from June 16 to 20 in Eindhoven, Netherlands.

UNIST Takes Part in 2025 Korea-Netherlands Advanced Semiconductor Initiative

UNIST is pleased to announce the successful participation of its Graduate School of Semiconductor Materials and Devices Engineering students in the ‘2025 Future Chips Academy: The Netherlands-Korea Joint Education Program on Cutting-E... Read More

Jul 01, 2025 By JooHyeon Heo News
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Revolutionary Low-Power, Non-Volatile Wireless Communication Semiconductor Developed for 6G and Autonomous Vehicles

The findings of this research have been published in Advanced Science on May 28, 2025.

Revolutionary Low-Power, Non-Volatile Wireless Communication Semiconductor Developed for 6G and Autonomous Vehicles

Abstract Vanadium oxide (VOx) based memristor is a promising candidate for next-generation non-volatile memory and radio-frequency (RF) switches due to its compatibility with wafer-level integration and high-frequency operation. This work d... Read More

Jun 30, 2025 By JooHyeon Heo Research
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MXene, One-Tenth Hair Thickness, Offers Exceptional High-Frequency EMI Shielding

The findings of this research were published in the renowned journal Advanced Materials on April 25, 2025.

MXene, One-Tenth Hair Thickness, Offers Exceptional High-Frequency EMI Shielding

Abstract Broadband and ultrathin electromagnetic interference (EMI)-shielding materials are crucial for efficient high-frequency data transmission in emerging technologies. MXenes are renowned for their outstanding electrical conductivity a... Read More

May 30, 2025 By JooHyeon Heo Research
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